Hafnium Nitride Powder

Hafnium Nitride (HfN) has a cubic crystal structure. Its melting point is 3310°C and microhardness is 16 GPa. It is quite stable, but easy to be corroded by aqua regia, concentrated sulfuric acid and hydrofluoric acid. It is produced by direct reaction of hafnium with nitrogen at 900°C, or by reaction of hafnium halide with ammonia or mixture of nitrogen and hydrogen. It’s an important component of hafnium alloy.

NCE provides Hafnium Nitride (HfN) Powder with different particle sizes. Please contact us for more details. Get a Quote Now! For other ceramic materials, please check our Ceramics catalog page.

Typical Applications:

Hafnium Nitride has excellent mechanical, electrical, optical, high temperature and corrosion resistance characteristics, and has very important applications in the field of mechanical manufacturing and microelectronics.

Nano Hafnium Nitride can be widely used in semiconductor, photoelectric and machining fields. Because of the integration of a variety of excellent mechanical, thermal, optical and corrosion wear resistance characteristics, the hafnium nitride nanometer film is expected to become an efficient optical window anti-reflection protection coating material, and can be used in aerospace key optical devices.

HfN is a new type of hard material with high melting point, high hardness, wear resistance and oxidation resistance. It can be used as protective layer for technical and decorative fields, abrasion resistant outer film for cutting tools, chemical inert film and high temperature resistant protective film.

Inquiries and orders should include the following information:

1. Quantity
2. Particle size

Standard Packing: Sealed bags and drums. Special package is available on request.